As IC design teams benefit from rapidly developing advanced process nodes in the past decades, the design challenges are also growing since designers push the limits of performance, complexity, size, power reduction and manufacturing scaling. Starting from 28nm, the increasing complexity of DRC rules began to stress traditional physical design flows. This trend is expected to continue, where DRC closure may become a serious bottleneck in design schedules. Designers need a new generation of physical design tools to address this effectively.
Caibre nmDRC responds to the need for reduced cycle time with revolutionary new capabilities that differentiate Calibre nmDRC substantially from traditional DRC tools, in this session, we are going to show you various methodologies and products we have today to speed up DRC closure for tape-out, including Calibre Recon, Calibre Grey Box, Calibre MTflex, Calibre Cloud, Calibre Realtime Digital and Calibre Analyze.
Franky Chen -Sr. Cooperate Application Engineer
Franky Chen is Sr. CAE in Mentor Global Customer Support and Success (GCSS) team. Franky received his master degree in Microelectronics from Shanghai University. Prior to his role in GCSS team, he had been with Globalfoundries and TSMC PDK team for 7 years, focusing on DRC rule deck development and automation flow setup.
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About Mentor Graphics Corporation
Mentor Graphics Corporation, a Siemens business, is a world leader in electronic hardware and software design solutions, providing products, consulting services, and award-winning support for the world’s most successful electronic, semiconductor, and systems companies. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. Web site: http://www.mentor.com.