Osram Opto Semiconductors has initiated an R&D project aimed at enhancing the electrical, optical and thermal functionalities of LEDs through the design of novel materials.

In the development of the Functional Inorganic Layers for Next Generation Optical Devices (FLINGO) project, different deposition methods for thin films such as atomic layer deposition, spray pyrolysis and the sol gel process for manufacturing LED light sources are to be investigated and combined.

Under the leadership of Dr. David O’Brien from Osram Opto Semiconductors, the project associates will be working on the entire bandwidth of component properties–including extended lifetime, smaller electrical layer resistance and improved light extraction. These require materials and innovative or adapted deposition processes.

In addition to project planner, Osram Opto Semiconductors, the FLINGO project also involves Uninova from the New University of Lisbon, Finnish thin film technology company Picosun Oy, Fraunhofer Institute for Silicate Research ISC in Würzburg and Vilnius University.

Fraunhofer ISC provides support with its know-how in the progress of inorganic layer systems which are to be used as the matrix for sensitive converter materials. Uninova will add its expertise in the manufacture of highly transparent and highly conductive layers which are needed for the p-contact in the LEDs. Picosun Oy is developing atomic layer deposition (ALD) processes and materials to ensure conformal coating of even heavily structured surfaces.

The Institute for Applied Research at Vilnius University provides specialist knowledge in the development and characterisation of non-destructive material properties and will analyse the layers and layer systems developed in the FLINGO project.

First seen on EE Times Europe.