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NIST grant to support imprint litho research
Author: David Lammers

The National Institute of Standards and Technology on Wednesday, May 5, 2004 approved funding for development of step-and-flash imprint lithography (S-FIL), with $17.6 million of NIST funds going to a group of companies working on the imprint approach developed at Molecular Imprints Inc. (MII), based in the U.S.

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