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IBM unveils remarkable progress in EUV lithography

Posted: 01 Aug 2014     Print Version  Bookmark and Share

Keywords:IBM  EUV lithography  scanner  wafer  extreme ultraviolet 

[Summary of tips] IBM has revealed better than expected results on its first full day of testing the latest ASML extreme ultraviolet (EUV) lithography system. According to the company, the NXE3300B scanner produced 637 wafers in 24 hours at a steady rate of 34 wafers/hour with a light source delivering 44W.EUV is the leading candidate for printi......
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