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Intel, Berkeley Lab develop super-resist for EUV

Posted: 21 Jul 2014     Print Version  Bookmark and Share

Keywords:Intel  super-resist  Berkeley Lab  EUV  e-beam lithography 

[Summary of tips] Intel Corp. and the U.S. Department of Energy's Lawrence Berkeley National Lab (Berkeley Lab) have joined forces to develop what they describe as an innovative super-resist that addresses the demands of advanced nodes of 10nm and below using extreme-ultra-violet (EUV) light.The problem was that EUV light sources are designed to......
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