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DSA technique pushes chip fabrication below 20nm

Posted: 04 Mar 2014  Print Version  Bookmark and Share

Keywords:DSA  lithography  20nm 

[Summary of tips] Speculations about the Moore's Law reaching its limits have prompted an MIT research on enabling semiconductor manufacturers to further shrink geometries below 20nm and produce advanced components cost effectively. A team of MIT researchers claim that the directed self-assembly (DSA) technique they have developed work out the l......
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