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Atomic-level deposition to benefit PV cells, LED lighting

Posted: 11 Feb 2014     Print Version  Bookmark and Share

Keywords:Tyndall National Institute  ALD  atomic layer deposition  ultra-thin film 

[Summary of tips] A team of scientists at Tyndall National Institute, Ireland, has claimed to have produced the first atom-by-atom simulation of nanoscale film growth by atomic layer deposition (ALD). According to them, the discovery could bring forth a different ALD processing of materials for solar cells and LED lighting.The virtual insight in......
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