EDA/IP 
Lithography friendly design for improving yield
Keywords:Lithography Friendly Design Resolution Enhancement Techniques Optical Proximity Correction
[Summary of tips] In the age of nanoscale, yield of a design is governed by the manufacturing process that involves pattern dependent effects due to lithography, and various manufacturing issues in addition to the traditional particle contamination. Inability of the complex conditional and recommended Design Rule Checks (DRC) to model the sensit......Please login or register with us to view this article>>
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