EDA/IP 
Film deposition technology for sub-32nm
Keywords: VECTOR conformal film deposition thermal oxide film transistor wafer
[Summary of tips] Novellus Systems has announced its development of conformal film deposition (CFD) technology for depositing 100 percent step coverage dielectric films on structures with aspect ratios of up to 4:1. This innovative technology answers sub-32nm requirements for front-end-of-line (FEOL) applications like gate liners and spacers, sh......Please login or register with us to view this article>>
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