Long road still to e-beam direct-write litho
Keywords: e-beam direct-write lithography nanoelectronics EUV
[Summary of tips] While multiple development efforts focused on e-beam direct-write lithography have reported progress, a one prominent lithography researcher claims production tools are still a minimum of five years away.Based on the length of time it has historically taken for each new lithography technology to move from proof-of-concept to pr......|
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