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Intel scales down 193nm litho to 15nm

Posted: 23 Jun 2009  Print Version  Bookmark and Share Subscribe 

Keywords:lithography  EUV  double-patterning 

[Summary of tips] In a possible breakthrough, chip giant Intel Corp. claims that it has pushed 193nm immersion lithography down to 15nm—at least in the lab. The disclosure is further evidence that 193nm immersion—with some form of a double-patterning technique—can scale much further than previously thought. It also means that e......
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