Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
 
EE Times-Asia > Manufacturing/Packaging
 
 
Manufacturing/Packaging  

Intel scales down 193nm litho to 15nm

Posted: 23 Jun 2009  Print Version  Bookmark and Share

Keywords:lithography  EUV  double-patterning 

[Summary of tips] In a possible breakthrough, chip giant Intel Corp. claims that it has pushed 193nm immersion lithography down to 15nm—at least in the lab. The disclosure is further evidence that 193nm immersion—with some form of a double-patterning technique—can scale much further than previously thought. It also means that e......
Please login or register with us to view this article>>
1 • 2 Next Page Last Page
 


Article Comments - Intel scales down 193nm litho to 15n...
Comments:  
*  You can enter [0] more charecters.
*Verify code:
 
Webinars

Seminars

Visit Asia Webinars to learn about the latest in technology and get practical design tips.

 
 
Back to Top