Manufacturing/Packaging 
Intel scales down 193nm litho to 15nm
Keywords: lithography EUV double-patterning
[Summary of tips] In a possible breakthrough, chip giant Intel Corp. claims that it has pushed 193nm immersion lithography down to 15nm—at least in the lab. The disclosure is further evidence that 193nm immersion—with some form of a double-patterning technique—can scale much further than previously thought. It also means that e......Please login or register with us to view this article>>
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