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Joint effort aims to enable 3D semiconductors

Posted: 01 Apr 2009  Print Version  Bookmark and Share Subscribe

Keywords: TSV joint effort  semiconductors 3D  thinning wafer 

[Summary of tips] Applied Materials Inc. and Disco Corp. have announced a joint effort to develop wafer thinning processes for fabricating through-silicon vias (TSVs) in 3D semiconductors. The two companies will be working together to develop integrated, high-performance process flows intended to lower the cost, reduce the risk and accelerate ti......
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