Global Sources
EE Times-Asia
Advanced Search
News
Products
Technical Articles
App Notes
ForumBlogsWhite PapersDatasheetsWebinars
 Challenges & Opportunities 2011     MCU     MEMS     IGBT     processor     LED     RFID
EE Times-Asia > EDA/IP
 
 
EDA/IP  

Process variability gets a second chance

Posted: 24 Mar 2009  Print Version  Bookmark and Share Subscribe

Keywords: process variability  DFM  design-for manufacturing 

[Summary of tips] Manufacturing process variability has been demonized by tool vendors looking to sell design-for-manufacturing (DFM) solutions. Now, one of them, Mentor Graphics Corp., has a new message: process variability is not all bad. In fact, it could be considered a competitive advantage if properly dealt with, according to executives at......
Please login or register with us to view this article>>
1 • 2 Next Page Last Page
 

votes:   Add to Favorites
IEEE okays low-power design spec
Court dismisses lawsuit vs. Qualcomm
Article Comments - Process variability gets a second ch...
Comments:  
*  You can enter [0] more charecters.
*Verify code:
 
Top Ranked Articles
High-quality Articles
Christmas Wishlist
    Kindle Fire Hot CE innovations at the CES

    All I want for Christmas is any of this year's Best of Innovations Design and Engineering Award honorees! Here's the EE Times pick for Top 10 CE gadgets.

Search EE Times Asia
Peek at Hot Gadgets for 2012
Smart energy "Try explaining to your eight-year-old son that instead of an Xbox, you got him a Wi-Fi enabled smart energy thermostat to help minimize his energy consumption and carbon footprint..."
 

Go to top