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EDA/IP  

NIL, IMS collaborate on nanoimprint litho

Posted: 29 Jan 2009  Print Version  Bookmark and Share Subscribe

Keywords: lithography nanoimprint  collaboration EBL  lithography electron beam 

[Summary of tips] NIL Technology and IMS Chips announced that they have started a collaboration on the fabrication of stamps for nanoimprint lithography (NIL) by combining their electron beam lithography (EBL) expertise. The companies have started a collaboration to efficiently combine their capabilities related to electron beam lithography.Whil......
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