Manufacturing/Packaging 
UMC pushes high-k process for 45nm
Keywords: lithography high-k process 45nm node
[Summary of tips] Foundry United Microelectronics Corp. has validated its high-k metal gate process with a test SRAM design run at the 45nm node. The move is a step toward the company's goal of offering a high-k process at the 32nm node in 2010.Intel Corp. claims it is seeing significant increases in performance and reductions in circuit leakage......Please login or register with us to view this article>>
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