Manufacturing/Packaging 
Toshiba 'validates' imprint litho for 22nm CMOS
Keywords:CMOS 22nm process node imprint litho
[Summary of tips] Toshiba Semiconductor Co. has reportedly validated the use of imprint lithography technology in developing 22nm node CMOS devices. The company fabricated narrow trench features at dimensions down to 18nm using an equipment from Molecular Imprints Inc. (MII) called Imprio 250 system.The findings were presented in a paper titled ......Please login or register with us to view this article>>
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