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Fracture-induced process simplifies nanoimprint litho

Posted: 10 Sep 2007  Print Version  Bookmark and Share Subscribe

Keywords: nanoimprint lithography  nanoimprint mold  fracture-induced structuring process 

[Summary of tips] Princeton University EE Stephen Chou claims to be able to simplify nanoimprint lithography by making the circuitry-pattern molds using a new fracture-induced structuring process.As founder of Nanonex Corp., a nanoimprint-lithography tool maker, Chou expects his latest discovery to eventually lower the cost of making nanoimprint......
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