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Mask metrology tool suits 45nm and beyond
Keywords: mask metrology system mask metrology tool automated mask metrology
[Summary of tips] Vistec Semiconductor Systems has introduced its next-generation mask metrology tool—the LMS IPRO4—that's designed to support mask metrology for the 45nm technology node and beyond. This tool is a fully automated mask metrology system capable of measuring registration (overlay on reticles) and critical dimensions (CD......Please login or register with us to view this article>>
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