FPGAs/PLDs 
IC firms announce gate material breakthroughs
Keywords: high-k dielectrics metal gates Core microarchitecture Penryn processors
[Summary of tips] Three entities—IBM Corp., Intel Corp. and Sematech—have separately disclosed breakthroughs in the development of high-k dielectrics and metal gates for use in advanced gate stack applications in logic designs.Intel Corp. has disclosed more details about its 45nm process, saying that it has implemented two materials&......Please login or register with us to view this article>>
|
Not yet registered?
 Register FREE to view unlimited features, tutorials and products, and enable any content alert service! |
Registered already? Login to view complete content.
|
Article Comments - IC firms announce gate material brea...
Visitor0530
(To avoid code verification, simply login or register with us. It is fast and free!)
Top Ranked Articles
Christmas Wishlist
All I want for Christmas is anything on this year's Best of Innovations Design and Engineering Award list!
Search EE Times Asia
Peek at Hot Gadgets for 2012
