Manufacturing/Packaging 
IBM pushes for immersion at 22nm
Keywords: lithography extreme ultraviolet immersion lithography dry lithography 193nm
[Summary of tips] IBM Corp. outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production. With the announcement, the company's plans for extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early de......Please login or register with us to view this article>>
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