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Sematech to advance planar solution devt for 22nm

Posted: 09 Feb 2007  Print Version  Bookmark and Share Subscribe

Keywords: Sematech  CMOS  CMOS planar scaling  FinFET  SiGe 

[Summary of tips] Pushing forward with the planar transistor scaling strategy under its CMOS Extension Program, Sematech front-end engineers will combine planar CMOS approaches with new channel materials to develop transistors for the 22nm half-pitch technology generation. Sematech will also continue to investigate FinFET devices as an alternati......
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