Global Sources
EE Times-Asia
 
EE Times-Asia > Manufacturing/Packaging
 
 
Manufacturing/Packaging  

Lithography efforts trailing 32nm target

Posted: 01 Aug 2006  Print Version  Bookmark and Share Subscribe

Keywords: David Lammers  lithography  32nm  VLSI Technology  The International Technology Roadmap for Semiconductors 

[Summary of tips] The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids. Neither option may be ready in time, forcing......
Please login or register with us to view this article>>
 

Article Comments - Lithography efforts trailing 32nm ta...
Comments:  
*  You can enter [0] more charecters.
*Verify code:
 
Peek at Hot Gadgets for 2012
Smart energy "Try explaining to your eight-year-old son that instead of an Xbox, you got him a Wi-Fi enabled smart energy thermostat to help minimize his energy consumption and carbon footprint..."
 

Go to top