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Freescale demonstrates CMOS tech with strained SOI substrates

Posted: 14 Jun 2006  Print Version  Bookmark and Share Subscribe

Keywords: Freescale Semiconductor  CMOS  SOI substrates 

[Summary of tips] Freescale Semiconductor demonstrated an advanced CMOS technology that utilizes strained silicon-on-insulator (SOI) substrates—a breakthrough that could deliver performance improvements and reduced power consumption for next generation semiconductor devices.Made possible by novel hybrid strain techniques, the technology of......
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