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Hope seen for taming IC process variability at 65nm
Keywords: Richard Goering chip design International Symposium on Physical Design 65nm IC process
[Summary of tips] Intensive CAD research by universities and semiconductor manufacturers is yielding new solutions for grappling with IC process variability. Presentations at the recent International Symposium on Physical Design (ISPD) offered new hope for chip design at 65nm and below, where temperature, voltage and process variations can have ......Please login or register with us to view this article>>
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