Manufacturing/Packaging 
New mask metrology tool supports 65nm and beyond
Keywords: leica Microsystems mask metrology tool lms ipro3 semicon europa 2005 65nm technology
[Summary of tips] BROKEN_TABLE_ HIDDEN_END --> BROKEN_PICTURE_ HIDDEN_END -->During this week's Semicon Europa 2005, Leica Microsystems has unveiled its new mask metrology tool Leica LMS IPRO3 that is designed to support mask metrology for the 65nm technology node and beyond.Compared to the previous tool generation LMS IPRO2, this new high end ......Please login or register with us to view this article>>
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