EDA/IP 
Wanted: New class of engineering generalists for DFM
Keywords: chip production model ic design photomask fab function eda
[Summary of tips] The traditional chip production model is disintegrating, with the communications gap widening among the IC design, photomask and fab functions, equipment makers and EDA vendors warned at the recent Bacus Symposium for Photomask Technology in California.The gap threatens the success of next-generation chip designs and their yiel......Please login or register with us to view this article>>
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