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Hitachi Chemical acquires resist materials patent

Posted: 08 Sep 2004  Print Version  Bookmark and Share Subscribe

Keywords: hitachi chemical  ic package  semi-additive method 

[Summary of tips] Hitachi Chemical Co. Ltd has acquired a basic patent regarding resist materials for manufacturing IC package substrates. The patent specifies the structure of photosensitive resin compositions in a resist material and parameters, such as the film thickness and aspect ratio (ratio of line width to film thickness) of the resist p......
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