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Cymer debuts light source for immersion lithography

Posted: 16 Jul 2004  Print Version  Bookmark and Share Subscribe

Keywords: cymer  excimer light source  xla 200  argon fluoride light source  arf light source 

[Summary of tips] Cymer Inc., a supplier of deep ultraviolet light sources, has unveiled an excimer light source designed to support immersion lithography at the 45nm manufacturing process node, the company said.The XLA 200 is the first such source, Cymer claimed, and uses a master oscillator power amplifier design with an argon fluoride (ArF) l......
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