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KLA-Tencor offering delivers surface planarity process control

Posted: 06 Jul 2004  Print Version  Bookmark and Share Subscribe

Keywords: kla-tencor  af-lm 300  atomic force microscopy  afm 

[Summary of tips] KLA-Tencor Corp. unveiled what it claims as the first true line monitoring solution for trench depth and surface planarity process control based on atomic force microscopy (AFM).According to the company, the AF-LM 300 delivers high reliability, unmatched ease of use, and increased throughput compared to traditional AFMs. It ena......
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