KLA-Tencor offering delivers surface planarity process control
Keywords: kla-tencor af-lm 300 atomic force microscopy afm
[Summary of tips] KLA-Tencor Corp. unveiled what it claims as the first true line monitoring solution for trench depth and surface planarity process control based on atomic force microscopy (AFM).According to the company, the AF-LM 300 delivers high reliability, unmatched ease of use, and increased throughput compared to traditional AFMs. It ena......|
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