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Manufacturing/Packaging  

TEL photomask system eyes 90-, 65nm device nodes

Posted: 15 Apr 2004  Print Version  Bookmark and Share Subscribe

Keywords: tokyo electron  tel  photomask resist coater/developer  clean track act m 

[Summary of tips] Tokyo Electron (TEL) has begun accepting orders for its Clean Track ACT M (mask) photomask resist coater/developer that is targeted for 90nm to 65nm technology nodes.Based on the company's Clean Track ACT platform, the device is based on three separate high performance application modules, including a photomask developer, photo......
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