Manufacturing/Packaging 
Toshiba device reduces measurement errors
Keywords: Toshiba measurement tool focus measurement technology semiconductor exposure system photomask pattern
[Summary of tips] Toshiba Corp. has announced that it would market a focus measurement technology that improves the focal measurement performance of semiconductor exposure systems.Featuring a photomask pattern that reduces measurement errors by approximately 90 percent, the focus measurement tool measures the focal accuracy of semiconductor expo......Please login or register with us to view this article>>
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