Manufacturing/Packaging 
NEC, Tokuyama develop resist for 8nm line widths
Keywords: nec tokuyama electron beam resist chloromethyl calix 4 arene
[Summary of tips] NEC Corp. and Tokuyama Corp. have jointly developed an electron beam resist that enables 8nm line etching with line edge roughness of <1nm.The new resist is chloromethyl calix 4 arene, which consists of four benzene rings connected in a 0.7nm(ø) ring.The small molecular mass of the resist enables the 8nm resolution. T......Please login or register with us to view this article>>
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