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Soitec, ASM target strained silicon on SOI

Posted: 27 May 2003  Print Version  Bookmark and Share Subscribe

Keywords: soitec  asm  single-wafer epitaxial reactor tool  epsilon 3000  ssoi wafer 

[Summary of tips] Soitec and ASM International announced that they are working together on strained SSOI technology, targeting the 65nm node.Soitec said that it has adopted the single-wafer epitaxial reactor tool, the Epsilon 3000, developed by ASM International. Soitec CEO Andre Auberton-Herve said the goal is to create a commercial supply of S......
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