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  [ Jul 6, 2008 ]
 
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EE Times Asia - Total Search 18 Articles
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Ultrafine-line lithography for next-gen apps
This technical article describes the ultrafine-line technology applied by researchers at the Georgia Institute of Technology for next-generation silicon device technology.
2000-11-01
The new century of high-density functional circuits
With every "electronic" product getting smaller and more powerful, manufacturing will need more innovation, denser interconnect schemes and better tools to meet the challenges ahead.
2001-06-01
System-in-a-cube to improve quality of life
Wireless bioelectronics communication systems pave an avenue toward a healthy body and lifestyle
2005-05-16
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EE Times India - Total Search 161 Articles
ST, Debiotech deliver insulin nanopump 2008-06-26
Solar cell market to grow by 40 per cent 2008-06-25
No-moving-parts design for MEMS 2008-06-20
Sensor simplifies system complexities 2008-06-17
Gyroscope sensors provide reduced standby power 2008-06-13

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Hot Keywords:  INTERFACE DESIGN   ENERGY HARVESTING  MOSFET  FPGA  OPTICAL



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