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| 2010-10-12 | Synopsis moves into optical design Synopsis moves into optical design |
| 2010-02-23 | Toshiba, AIST work to extend optical litho life Toshiba, AIST work to extend optical litho life |
| 2009-06-02 | Nanocrystals key to sub-32nm optical litho Nanocrystals key to sub-32nm optical litho |
| 2008-07-24 | Optical lithography can cover 12nm, says MIT Optical lithography can cover 12nm, says MIT |
| 2008-05-16 | HP details silicon photonics road map HP has outlined its goal to use silicon photonics to connect blades, boards, chips and eventually cores on the same chip at HP Labs's first annual Photonic Interconnect Forum this week. |
| 2008-02-29 | Sematech launches nanoimprint litho program Sematech has started a development program in nanoimprint lithography, a move that's expected to be a major boost in this arena. |
| 2008-02-01 | Awaiting the bountiful organic chip harvest According to research firm NanoMarkets, revenues from products based on organic thin-film transistors (OTFTs) and organic memories will reach $21.6 billion by 2015. |
| 2007-10-26 | Toshiba taps optical lithography in fabs Toshiba taps optical lithography in fabs |
| 2007-06-25 | Intel drafts inverse litho to cover EUV delay With the possible delay of its EUV lithography, Intel disclosed it is developing a DFM technology that could extend optical scanners to the 22nm node. |
| 2007-04-19 | Synopsys, NGR team on faster OPC model at 45nm Synopsys and NanoGeometry Research announced they have partnered to enable faster, more accurate, more predictive optical proximity correction (OPC) model-building at 45nm and beyond. |
| 2006-02-22 | IBM claims 193nm litho record At the SPIE Microlithography Conference, IBM said that it has created the world's smallest line patterns using 193nm optical lithography. |
| 2006-01-31 | Tool claims dramatic reduction in OPC closure time Aprio introduced the Halo-Fix tool that makes available the LRC repair technology used by the company's Halo-OPC product to manufacturers using third-party LRC and OPC tool sets. |
| 2005-12-01 | Manufacturing moves into design flow null |
| 2005-06-20 | Grace adopts Synopsys tool suite for chip production Mainland China-based pure IC foundry Grace Semiconductor Mfg Corp. has adopted U.S.-based Synopsys Inc.' design for manufacturing (DFM) tool suite, particularly using the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool to lower mask turnaround time and to enhance its ability to produce high-yielding chips. |
| 2005-04-18 | Nanoimprint litho makes its mark at SPIE While nanoimprint vendors made impressive claims in a recent conference in California, analysts noted that the market is in its infancy. |
| 2005-04-12 | SUSS' new tool replaces traditional optical lithography SUSS' new tool replaces traditional optical lithography |
| 2005-03-04 | Synopsys software tool allows Grace to produce high-yielding chips Synopsys Inc. announced that China-based Grace Semiconductor Mfg Corp. has adopted the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool. |
| 2004-03-02 | Intel, Media Lario join forces in optical component R&D Intel, Media Lario join forces in optical component R&D |
| 2003-02-19 | EUV activity shifts to Sematech North Developers of EUV lithography are looking north, specifically to the University at Albany, State University of New York, for their future. |
| 2003-02-04 | AIST, Waseda University to enhance photonic crystals The Photonics Research Institute of the National Institute of AIST and Waseda University have developed a technique to create photonic crystals made of titanium dioxide with higher light transmission in the optical communications waveband. |
| 2002-08-01 | Tabletop system generates extreme-UV laser light A small, inexpensive tabletop laser system that can produce coherent EUV laser light has been built by a research team at the University of Colorado. |
| 2002-07-25 | Industry said to face steep lithography challenges Industry said to face steep lithography challenges |
| 2002-07-11 | KLA-Tencor enhances metrology system KLA-Tencor Corp. has introduced the Archer Analyzer software for its Archer 10 optical overlay metrology system. |
| 2002-06-26 | KLA-Tencor metrology tool features wafer monitoring KLA-Tencor Corp. has introduced the SpectraFx 100, its fifth-generation optical thin-film metrology system, which enables product wafer monitoring for 193nm DUV lithography and copper interconnect processes. |
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