Sharp crafts revolutionary IGZO tech for displays
This jointly developed new IGZO technology imparts crystallinity in an oxide semiconductor composed of indium (In), gallium (Ga) and zinc (Zn). Sharp and SEL have named this crystalline structure a CAAC (C-Axis Aligned Crystal) structure. Compared to current amorphous IGZO semiconductors, it enables even smaller thin-film transistors to be achieved and provides higher performance.
This new material is expected to be adopted for use in LCD displays for mobile devices such as smartphones where the trend toward higher screen resolutions is growing increasingly strong. The technology can also be adapted for use in organic EL displays which hold out high expectations for the future.
Although challenges to commercialization remain in terms of both service life and production, Sharp and Semicoonductor Energy Laboratory will work together to continue to push ahead with R&D in anticipation of future market needs.
With the aim of early commercialization LCD displays using this new IGZO technology, the two companies will also be pursuing R&D to expand the use of this material in non-display devices and to develop applications other than displays in the future.
Below are the specifications of the prototype displays.