ATMI, CVD, SiGen introduce a new class of components
ATMI and Ovonyx declared that "This work enabled conformal depositions in high aspect ratio PCM cells and demonstrated good electrical results when compared to sputter-deposited GST 225 on comparable device structures." Results include various CVD alloy depositions that demonstrated set speed below 50ns, typical endurance of 108-1010 cycles, and data retention that exceeded 100°C for 10 years.
"GST-based PCM continues to show significant commercial potential as a replacement memory technology for NOR Flash and segments of DRAM markets," said Tod Higinbotham, ATMI's executive VP and general manager of microelectronics.
"However, one of the challenges in the path to more rapid scaling has been the lack of a CVD process capable of producing fully confined cells for further reset current reduction. Reduction in reset current will lead to memory devices that use less power, extending battery life and offering higher data bandwidth—important factors in today's data-centric, highly portable consumer devices," he added.
The companies plan to license the technologies to the semiconductor industry with ATMI providing the associated precursor materials and the deposition technologies, thus further enabling and accelerating the commercialization of PCM for high performance memory applications. ATMI is on track to demonstrate the CVD GST technology on full 300mm wafers in Q4 10.
Meanwhile, CVD Equipment Corp. and Graphene Laboratories Inc. have introduced a line of CVD graphene products.
These include large-area single layer graphene films grown on copper foils or copper-coated wafers. CVD Equipment will manufacture single-layer CVD grown graphene-based materials and products. Graphene Laboratories will provide marketing of the new products with the CVDGraphene trademark for sale worldwide.
Graphene is a carbon nanomaterial film that is only one atom thick and has unique electrical and mechanical properties as well as supreme stability and durability. CVD grown graphene is projected to be used for production of graphene-based electronics, sensors, MEMS and solar batteries.
Not to be outdone, Silicon Genesis (SiGen), a developer of process and technology for engineered substrates, has started production of solar wafers using its new high volume manufacturing system, dubbed PolyMax.
SiGen has produced 85µm thick, 156mm2 kerf-free monocrystalline silicon wafers. Kerf is the material converted into saw dust, inherent in all sawing processes. This achievement delivers the first true mono c-Si kerf-free wafering for the PV industry.
''The introduction of the PolyMax high volume manufacturing system brings the industry one step closer to replacing wire saw processes with a lower cost waste-free wafering solution. A key strength of the PolyMax system is its ability to produce wafers thinner than is achievable with wire saw technology, allowing the industry to produce cells with higher conversion efficiencies and lower cost,'' according to SiGen.
- Mark LaPedus
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