For Registered Users Home / For Registered Users

IBM alliance makes progress in 32nm high-k metal gates
Author:John Walko

IBM and its partners in the race to develop and ship high-k dielectrics and metal gates for the 32nm node have officially revealed their process and are claiming they can now outperform the rest of the industry in performance and power consumption.

Please login to view article>>


If you have already registered on the following websites, please log in using your email address and password

EE Times-Asia sites:

Latest News
Talkback

eeForum:
Demystifying Vietnam

What does Vietnam offer that a rising number of top-tier semiconductor companies are setting up and expanding operations there?

more

 
Top tech resources
 
Go to top