Tool limits need for immersion lithography at 45nm
Author: Dylan McGrath
Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm.
Please login or register with us to view this article>>
Registered already? Login to view complete content.
If you have already registered on the following websites, please log in using your email address and password
eeForum: Demystifying Vietnam What does Vietnam offer that a rising number of top-tier semiconductor companies are setting up and expanding operations there?