For Registered Users Home / For Registered Users

Collaboration to develop ultra-thin gate-insulation layers


STMicro, CEA-Leti and AIXTRON developed an advanced process technology for the creation of ultra-thin transistor-gate-insulation layers for low-power apps.

Please login or register with us to view this article>>


If you have already registered on the following websites, please log in using your email address and password

EE Times-Asia sites:

Latest News
Talkback

eeForum:
Demystifying Vietnam

What does Vietnam offer that a rising number of top-tier semiconductor companies are setting up and expanding operations there?

more

 
Top tech resources
 
Go to top