Home | Login | Register Now   [Jan 08,2009]
Global Sources
EE Times-Asia
For Registered Users Home / For Registered Users

Shipley, Therma-Wave ink nano-metrology development deal


Shipley Co. has signed a joint development agreement with Therma-Wave Inc. in which the two companies will co-develop scatterometric methods to better measure 130nm photoresist features for polysilicon gate and shallow trench applications.

Please login or register with us to view this article>>


If you have already registered on the following websites, please log in using your email address and password

EE Times-Asia sites:

Latest News
Talkback

eeForum:
Demystifying Vietnam

What does Vietnam offer that a rising number of top-tier semiconductor companies are setting up and expanding operations there?

more

 
Top tech resources
 
India Newsletter
 
Go to top